Megalo x PhotoAccess: Masking the Process is an exciting cross-disciplinary workshop run by artist Ben Rak, hosted at both PhotoAccess and Megalo Print Studio.
Take the rare opportunity to discover two Canberra arts institutions in one go whilst unpacking the concepts and processes behind Ben Rak’s exhibition, Don’t be Fooled by the Faces I Wear, showing at PhotoAccess from July 15 to August 15.
Don’t be Fooled by the Faces I Wear is an attempt to shed light on the ways in which people conceal or reveal themselves in our complex, surface based society. Exploring the idea of masks, in this workshop you’ll utilise both photography and screen-printing methods to create your own innovative ‘masked’ image.
Due to the uncertain nature of the COVID-19 lockdowns, please register your interest by emailing [email protected], and we will notify you when this workshop is confirmed to proceed.
The tentative dates for this workshop are October 9th and 10th, 2021, yet this will be confirmed closer to the date. Feel free to enrol with payment below, and you will be guaranteed a place if the workshop does run!
Under the tutelage of artist Ben Rak, you will learn to prepare your photographs for screen-printing (using Photoshop), expose your photos to a screen, and learn to print them as either monotone or multi-colour artworks.
Beginning with a theoretical discussion of what is a print, what is a photo, and how these definitions are fluid, you will create self-portrait photographs which will then be manipulated into “mask” images and processed for screen-printing.
If you’re already a photographer, this workshop is a great way to uncover the potential of outputting your images as screen-prints. If you’re already a screen-printer, this is a fantastic opportunity to develop your photography skills and concepts.
By the end of the workshop you will have gained an understanding of how photographic screen-printing works, and how to print an edition of screen-prints.
You will leave the weekend with multiple editions of your work. No prior screen-printing experience necessary, but some understanding of basic photoshop is required.
An artist, educator, and independent curator, Ben Rak was born in California, in the United States, and is presently working and living in Sydney, Australia, where he lectures at the University of New South Wales Art & Design.
Rak holds a BFA in printmaking (2008) with first-class honours (2009) and an MFA (2013), both from the University of New South Wales. Rak has also curated touring exhibitions themed around the use of print process as a metaphor, as well as exchange exhibitions with institutions such as The School of The Art institute of Chicago (USA) and Indus Valley School of Art & Design (Pakistan).
Rak is currently undertaking a PhD at the University of New South Wales, where he is examining the phenomenon of ‘passing’ as a condition in both social life and art practice. He is interested in the capacity for the print to act as a metaphor for contested identities and the agency afforded to the print when it passes as another medium.
The tentative dates for the workshop are October 9th and 10th, 2021. If you have registered you interest you will be contacted to enrol should these dates go ahead. PhotoAccess reserves the right to cancel the workshop if there are insufficient enrolments. If we have to cancel, you’ll receive a full refund.
PhotoAccess will happily refund or transfer workshop fees up to 7 days prior to the start date of the workshop. If less than 7 days notice is given PhotoAccess will transfer fees to another workshop but will charge a transfer fee of either 25% of the workshop cost or $50, whichever is less. No refunds or transfers can be given once a workshop has started. Please note that memberships purchased in conjunction with a workshop enrolment are non-refundable. See Terms and Conditions for further details.