DOUBLE EXPOSURE RESIDENCY
PhotoAccess is excited to launch the second edition of DOUBLE EXPOSURE, a supported artist residency program offering one interstate or international photo-based artist a five-week opportunity to produce new work, using PhotoAccess’ Darkroom and facilities.
DOUBLE EXPOSURE supports the creation of new and innovative still and or moving photo-based work. Priority will be given to artists who work experimentally using darkroom-based processes. The successful artist will receive a stipend, materials allowance, a contribution towards travel expenses, accommodation at EAST Hotel and extended access to PhotoAccess’ specialised darkroom, film developing and digital facilities. This opportunity also includes a solo exhibition in the PhotoAccess Huw Davies Gallery in November 2019.
The artist will also be required to participate in a ‘Meet the Artist or Artist in Conversation’ public program hosted by Joe’s Bar & EAST Hotel during their stay.
Artists at all stages of their career are invited to apply.
Artists enrolled in formal study in 2019 or who permanently reside in the ACT (Australia), are not eligible to apply.
This is a five-week supported residency opportunity open to Australian and International artists at all stages of their career to spend dedicated time creating a new body of work. You get:
Midnight (AEST) Sunday 18 November 2018
All applications must be submitted online. All applicants will be notified of the outcome by mid December 2018